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김주영

Kim, Ju-Young
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dc.citation.endPage 345 -
dc.citation.startPage 342 -
dc.citation.title MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING -
dc.citation.volume 38 -
dc.contributor.author Kim, Ki-Bok -
dc.contributor.author Lee Yun-Hee -
dc.contributor.author Kim, Yongil -
dc.contributor.author Park, Jongseo -
dc.contributor.author Ahn, Seung-min -
dc.contributor.author Kim, Ju-Young -
dc.date.accessioned 2023-12-22T00:41:19Z -
dc.date.available 2023-12-22T00:41:19Z -
dc.date.created 2015-03-24 -
dc.date.issued 2015-10 -
dc.description.abstract If all components in a nanoindentation system are well calibrated and a reference material has unique hardness, H and reduced modulus, E r independent of the indentation depths, the load, L and the penetration depth, h in the indentation loading curve of the reference material can be correlated by L=Kh 2. Here the constant K is expressed by H, E r and indenter geometry constants. By using H and E r of a fused silica and the Berkovich geometry, an analytical expression for the indentation loading curve could be derived. To compare with this analytical loading curve, experimental indentation data were measured with two commercial nanoindenters. The experimental loading curves shifted leftward or rightward from the analytical loading curve and this depth deviation was attributed to improper calibration of the nanoindenters. Quantitative calibrations of frame compliance and indenter bluntness were tried for the raw nanoindentation data and this resulted in consistent nanoindentation data regardless of the used nanoindenters -
dc.identifier.bibliographicCitation MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v.38, pp.342 - 345 -
dc.identifier.doi 10.1016/j.mssp.2014.09.007 -
dc.identifier.issn 1369-8001 -
dc.identifier.scopusid 2-s2.0-84931575962 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/10983 -
dc.identifier.url http://www.sciencedirect.com/science/article/pii/S1369800114004909 -
dc.identifier.wosid 000357839800049 -
dc.language 영어 -
dc.publisher ELSEVIER SCI LTD -
dc.title Predictions of frame compliance and apex morphology in sharp nanoindentations -
dc.type Article -
dc.description.isOpenAccess FALSE -
dc.relation.journalWebOfScienceCategory Engineering, Electrical & Electronic; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter -
dc.relation.journalResearchArea Engineering; Materials Science; Physics -
dc.description.journalRegisteredClass scie -
dc.description.journalRegisteredClass scopus -
dc.subject.keywordAuthor Nanoindentation -
dc.subject.keywordAuthor Analytical loading curve -
dc.subject.keywordAuthor Fused silica -
dc.subject.keywordAuthor System calibration -
dc.subject.keywordAuthor Frame compliance -
dc.subject.keywordAuthor Indenter apex morphology -
dc.subject.keywordPlus SENSING INDENTATION EXPERIMENTS -
dc.subject.keywordPlus HARDNESS -
dc.subject.keywordPlus AREA -

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