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Small and Simple Molecular Structure Based Thermally Stable Ruthenium Precursor in Advancing Ruthenium ALD Process for Scaled Interconnect Metallization File File

Nakatsubo, Hideaki , Mohapatra, Debananda , Lee, Eun-soo , Kim, Jeongha , Cho, Iaan , Iseki, Masato , Shigetomi, Toshiyuki , Harada, Ryosuke , Na, Sang-woong , Cheon, Taehoon , et al

Article Issue Date2026-02 View18
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