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Electron and Hole Trapping Characteristics of a Low-Temperature Atomic Layer-Deposited HfO2 Charge-Trap Layer for Charge-Trap Flash MemoryCl File

Noh, Taeyun , Han, Jimin , Jeong, Boyoung , Park, Jae-Gwan , Kim, Kihyeun , Lee, Minju , Kim, Bio , Choi, Hanmei , Yoon, Tae-Sik

Article Issue Date2025-02 View50
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