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Yttrium carbide thin film as an emerging transition metal carbide Prepared by plasma-enhanced atomic layer deposition for Dual diffusion barrier applications into Cu and Ru metallization File

Kweon, Minjeong , Park, Chaehyun , Mohapatra, Debananda , Kim, Sang Bok , Bae, Jong-Seong , Cheon, Taehoon , Kim, Soo-Hyun

Article Issue Date2025-08 View138
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