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A controlled growth of WNx, and WCx thin films prepared by atomic layer deposition File

Kim, Jun Beom , Jang, Byeonghyeon , Lee, Hyun-Jung , Han, Won Seok , Lee, Do-Joong , Lee, Han-Bo-Ram , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2016-04 View92
Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier File

Kim, Jun Beom , Nandi, Dip K. , Kim, Tae Hyun , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2019-09 View262
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