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Browsing by Keyword : TUNGSTEN THIN-FILMS

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Phase and microstructure of ALD-W films deposited using B2H6 and WF6 and their effects on CVD-W growth File

Kim, Soo-Hyun , Yeom, Seung-Jin , Kwak, Nohjung , Sohn, Hyunchul

Article Issue Date2007-12 View128
Pulsed CVD-W Nucleation Layer Using WF6 and B2H6 for Low Resistivity W File

Kim, Choon-Hwan , Rho, Il-Cheol , Kim, Soo-Hyun , Han, Il-Keoun , Kang, Hyo-Sang , Ryu, Seung-Wook , Kim, Hyeong-Joon

Article Issue Date2009-06 View152
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