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Layer-by-layer NH3 plasma treatment for area-selective atomic layer deposition of high-quality SiO2 thin films File

Lee, Sanghun , Seo, Seunggi , Kim, Tae Hyun , Yoon, Hwi , Park, Seonyeong , Na, Seunggyu , Seo, Jeongwoo , Kim, Soo-Hyun , Chung, Seung-min , Kim, Hyungjun

Article Issue Date2025-03 View30
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