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Characterization of a Ru-based ternary-oxide thin film for a diffusion barrier File

Hong, Tae Eun , Jeong, E. D. , Byeon, M. R. , Kang, Y. B. , Yang, Ho-Soon , Kim, Soo-Hyun

Article Issue Date2012-09 View99
Effects of AlOx incorporation into atomic layer deposited Ru thin films: Applications to Cu direct plating technology File

Hong, Tae Eun , Cheon, Taehoon , Kim, Soo-Hyun , Kim, Jeong-Kyu , Park, Young-Bae , Kwon, Oh Joong , Kim, Myung Jun , Kim, Jae Jeong

Article Issue Date2013-12 View89
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