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A bilayer diffusion barrier of Ru/WSixNy for advanced Cu interconnects File

Eom, Tae-Kwang , Sari, Windu , Cheon, Taehoon , Kim, Soo-Hyun , Kim, Woo Kyoung

Article Issue Date2012-10 View83
Cactus-Like Hollow Cu2-xS@Ru Nanoplates as Excellent and Robust Electrocatalysts for the Alkaline Hydrogen Evolution Reaction File

Yoon, Donghwan , Lee, Jaeyoung , Seo, Bora , Kim, Byeongyoon , Baik, Hionsuck , Joo, Sang Hoon , Lee, Kwangyeol

Article Issue Date2017-08 View242
Effects of annealing on the properties of atomic layer deposited Ru thin films deposited by NH3 and H-2 as reactants File

Lee, Seung-Joon , Kim, Soo-Hyun

Article Issue Date2016-08 View87
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