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Group IV Transition Metal (M = Zr, Hf) Precursors for High-kappa Metal Oxide Thin Films File

Lee, Ga Yeon , Yeo, Seungmin , Han, Seong Ho , Park, Bo Keun , Eom, Taeyong , Kim, Jeong Hwan , Kim, Soo-Hyun , Kim, Hyungjun , Son, Seung Uk , Chung, Taek-Mo

Article Issue Date2021-12 View93
Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor File

Ansari, Mohd Zahid , Janicek, Petr , Park, Ye Jin , NamGung, Sook , Cho, Bo Yeon , Nandi, Dip K. , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Cheon, Taehoon , et al

Article Issue Date2023-05 View147
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