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Atomic layer deposition of ruthenium (Ru) thin films using ethylbenzen-cyclohexadiene Ru(0) as a seed layer for copper metallization File

Yeo, Seungmin , Choi, Sang-Hyeok , Park, Ji-Yoon , Kim, Soo-Hyun , Cheon, Taehoon , Lim, Byoung-Yong , Kim, Sunjung

Article Issue Date2013-11 View72
Coalescence-enhanced melting in the incipient stage of surface melting File

Nguyen, Cao Thang , Ho, Duc Tam , Kim, Sung Youb

Article Issue Date2024-06 View172
Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition File

Park, Ji-Yoon , Yeo, Seungmin , Cheon, Taehoon , Kim, Soo-Hyun , Kim, Min-Kyu , Kim, Hyungjun , Hong, Tae Eun , Lee, Do-Joong

Article Issue Date2014-10 View108
Nucleation-controlled growth of Cu thin films electrodeposited directly on ALD Ru diffusion barrier in additive-free electrolyte for Cu interconnect File

Im, Byoungyong , Kim, Sunjung , Kim, Soo-Hyun

Article Issue Date2023-04 View126
Ruthenium and ruthenium dioxide thin films deposited by atomic layer deposition using a novel zero-valent metalorganic precursor, (ethylbenzene)(1,3-butadiene)Ru(0), and molecular oxygen File

Yeo, Seungmin , Park, Ji-Yoon , Lee, Seung-Joon , Lee, Do-Joong , Seo, Jong Hyun , Kim, Soo-Hyun

Article Issue Date2015-04 View88
Seed-mediated synthesis of ultra-long copper nanowires and their application as transparent conducting electrodes File

Kim, Hyunhong , Choi, Seong-Hyeon , Kim, Mijung , Park, Jang-Ung , Bae, Joonwon , Park, Jongnam

Article Issue Date2017-11 View133
Seedless electrodeposition of Cu thin films on ALD Ru diffusion barriers with different electrical properties File

Im, Byoungyong , Mun, Kiyeung , Kim, Sunjung , Kim, Soo-Hyun

Article Issue Date2023-03 View126
TonEBP degradation is essential for microtubule nucleation and regrowth File

Chinbold, Batchingis , Kwon, Hyug Moo , Park, Raekil

Article Issue Date2024-11 View129
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