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Effects of B2H6 pretreatment on ALD of W film using a sequential supply of WF6 and SiH4 File

Kim, Soo-Hyun , Hwang, ES , Kim, BM , Lee, JW , Sun, HJ , Hong, TE , Kim, JK , Sohn, H , Kim, J , Yoon, Tae-Sik

Article Issue Date2005-08 View183
Improvement of Adhesion Performances of CVD-W Films Deposited on B2H6-Based ALD-W Nucleation Layer File

Kim, Choon-Hwan , Rho, Il-Cheol , Kim, Soo-Hyun , Sohn, Yong-Sun , Kang, Hyo-Sang , Kim, Hyeong-Joon

Article Issue Date2008-03 View89
Pulsed CVD-W Nucleation Layer Using WF6 and B2H6 for Low Resistivity W File

Kim, Choon-Hwan , Rho, Il-Cheol , Kim, Soo-Hyun , Han, Il-Keoun , Kang, Hyo-Sang , Ryu, Seung-Wook , Kim, Hyeong-Joon

Article Issue Date2009-06 View152
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