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Atomic Layer Deposition of Co Using N-2/H-2 Plasma as a Reactant File

Yoon, Jaehong , Lee, Han-Bo-Ram , Kim, Doyoung , Cheon, Taehoon , Kim, Soo-Hyun , Kim, Hyungjun

Article Issue Date2011-10 View139
Characteristics of the nanoscale titanium film deposited by plasma enhanced chemical vapor deposition and comparison of the film properties with the film by physical vapor deposition File

Lee, Joo Wan , Kim, Soo-Hyun , Kwak, No Jung , Lee, Young Jin , Sohn, Hyun Chul , Kim, Jin Woong , Sun, Ho-Jung

Article Issue Date2006-05 View114
Formation of Ni silicide from atomic layer deposited Ni File

Yoon, Jaehong , Kim, Soo Hyeon , Kim, Hangil , Kim, Soo-Hyun , Kim, Hyungjun , Lee, Han-Bo-Ram

Article Issue Date2016-07 View121
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