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Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor File

Ansari, Mohd Zahid , Janicek, Petr , Park, Ye Jin , NamGung, Sook , Cho, Bo Yeon , Nandi, Dip K. , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Cheon, Taehoon , et al

Article Issue Date2023-05 View90
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