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In-situ post-doping plasma process during atomic layer deposition of Al-doped TiO2 for sub-nanometer lattice ordering and defect annihilation File

Lee, Gyuha , Sunwoo, Youngmin , Kim, Hyong June , Han, Geongu , Oh, Jeongmin , Lee, Sangwon , Kim, Byungjo , An, Jihwan

Article Issue Date2026-02 View1261
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