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Comparative study on growth characteristics and electrical properties of ZrO2 films grown using pulsed plasma-enhanced chemical vapor deposition and plasma-enhanced atomic layer deposition for oxide thin film transistors File

Jung, Hanearl , Oh, Il-Kwon , Yeo, Seungmin , Kim, Hyungjun , Lee, Su Jeong , Kim, Yun Cheol , Myoung, Jae-Min , Kim, Soo-Hyun , Lim, Jun Hyung , Lee, Sunhee

Article Issue Date2017-05 View118
Graphene-insulator-metal diodes: Enhanced dielectric strength of the Al2O3 barrier File

Kunc, J. , Fridrisek, T. , Shestopalov, M. , Jo, J. , Park, Kibog

Article Issue Date2024-09 View222
Growth and Characterization of BeO Thin Films Grown by Atomic Layer Deposition Using H2O and O3 as Oxygen Sources File

Lee, Woo Chul , Cho, Cheol Jin , Kim, Sangtae , Larsen, Eric S. , Yum, Jung Hwan , Bielawski, Christopher W. , Hwang, Cheol Seong , Kim, Seong Keun

Article Issue Date2017-08 View79
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