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Functionalization of Si3N4 with an aldehyde inhibitor for area selective deposition of HfO2 and SiO2 File

Lee Byungchan , Shim Seungwon , Trinh Ngoc Le , Patil Aravind H. , Nguyen Chi Thang , Cheon Taehoon , Kim, Soo-Hyun , Kang Youngho , Lee Han-Bo-Ram

Article Issue Date2025-09 View13
Implementation of Low-Power Electronic Devices Using Solution-Processed Tantalum Pentoxide Dielectric File

Heo, Jungwoo , Park, Song Yi , Kim, Jae Won , Song, Seyeong , Yoon, Yung Jin , Jeong, Jaeki , Jang, Hyungsu , Lee, Kang Taek , Seo, Jung Hwa , Walker, Bright , et al

Article Issue Date2018-07 View169
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