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Improved interface quality of atomic-layer-deposited ZrO2 metal-insulator-metal capacitors with Ru bottom electrodes File

Lee, Jae Hwan , Park, Bo-Eun , Thompson, David , Choe, Myeonggi , Lee, Zonghoon , Oh, Il-Kwon , Kim, Woo-Hee , Kim, Hyungjun

Article Issue Date2020-05 View26
In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides File

Oh, Il-Kwon , Kim, Kangsik , Lee, Zonghoon , Song, Jeong-Gyu , Lee, Chang Wan , Thompson, David , Lee, Han-Bo-Ram , Kim, Woo-Hee , Maeng, Wan Joo , Kim, Hyungjun

Article Issue Date2015-05 View20
Significant Enhancement of the Dielectric Constant through the Doping of CeO2 into HfO2 by Atomic Layer Deposition File

Kim, Woo-Hee , Kim, Min-Kyu , Oh, Il-Kwon , Maeng, Wan Joo , Cheon, Taehoon , Kim, Soo-Hyun , Noori, Atif , Thompson, David , Chu, Schubert , Kim, Hyungjun

Article Issue Date2014-04 View19
Ultrathin ferroic HfO2–ZrO2 superlattice gate stack for advanced transistors File

Cheema, Suraj S. , Shanker, Nirmaan , Wang, Li-Chen , Hsu, Cheng-Hsiang , Hsu, Shang-Lin , Liao, Yu-Hung , San Jose, Matthew , Gomez, Jorge , Chakraborty, Wriddhi , Li, Wenshen , et al

Article Issue Date2022-04 View32
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