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Significant Enhancement of the Dielectric Constant through the Doping of CeO2 into HfO2 by Atomic Layer Deposition File

Kim, Woo-Hee , Kim, Min-Kyu , Oh, Il-Kwon , Maeng, Wan Joo , Cheon, Taehoon , Kim, Soo-Hyun , Noori, Atif , Thompson, David , Chu, Schubert , Kim, Hyungjun

Article Issue Date2014-04 View19
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