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Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu File

Han, Seung-Min , Nandi, Dip K. , Joo, Yong-Hwan , Shigetomi, Toshiyuki , Suzuki, Kazuharu , Nabeya, Shunichi , Harada, Ryosuke , Kim, Soo-Hyun

Article Issue Date2020-05 View31
Atomic Layer Deposition of Ru Thin Films Using a New Beta-Diketonate Ru Precursor and NH3 Plasma as a Reactant File

Jung, Jae-Hun , Lee, Seung-Joon , Lee, Hyun-Jung , Lee, Min Young , Cheon, Taehoon , Bae, So Ik , Saito, Masayuki , Suzuki, Kazuharu , Nabeya, Shunichi , Lee, Jeongyeop , et al

Article Issue Date2015-11 View46
Plasma-free atomic layer deposition of Ru thin films using H-2 molecules as a nonoxidizing reactant File

Lee, Seung-Joon , Kim, Soo-Hyun , Saito, Masayuki , Suzuki, Kazuharu , Nabeya, Shunichi , Lee, Jeongyeop , Kim, Sangdeok , Yeom, Seungjin , Lee, Do-Joong

Article Issue Date2016-05 View38
Selective Atomic Layer Deposition of Metals on Graphene for Transparent Conducting Electrode Application File

Kim, Minsu , Nabeya, Shunichi , Han, Seung-Min , Kim, Min-Sik , Lee, Sangbong , Kim, Hyun-Mi , Cho, Seong-Yong , Lee, Do-Joong , Kim, Soo-Hyun , Kim, Ki-Bum

Article Issue Date2020-03 View37
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