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Issue DateTitleAuthor(s)TypeView
2010-04-26Selective epitaxial growth of silicon layer using batch-type equipment for vertical diode application for next generation memoriesLee, Kong-Soo; Yoo, Dae-Han; Yoo, Young-Sub; Han, Jae-Jong; Kim, Seok-Sik; Jeong, Hong-Sik; Kang, Chang-Jin; Moon, Joo-Tae; Park, Hyunho; Jeong, Hanwook; Kim, Kwang-Ryul; Choi, ByoungdeogCONFERENCE22
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