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In situ surface cleaning on a Ge substrate using TMA and MgCp2 for HfO2-based gate oxides File

Oh, Il-Kwon , Kim, Kangsik , Lee, Zonghoon , Song, Jeong-Gyu , Lee, Chang Wan , Thompson, David , Lee, Han-Bo-Ram , Kim, Woo-Hee , Maeng, Wan Joo , Kim, Hyungjun

Article Issue Date2015-05 View39
Significant Enhancement of the Dielectric Constant through the Doping of CeO2 into HfO2 by Atomic Layer Deposition File

Kim, Woo-Hee , Kim, Min-Kyu , Oh, Il-Kwon , Maeng, Wan Joo , Cheon, Taehoon , Kim, Soo-Hyun , Noori, Atif , Thompson, David , Chu, Schubert , Kim, Hyungjun

Article Issue Date2014-04 View26
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