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Capacitance Matching for Stabilizing Negative Capacitance Effect in MOS Gate Stack Based on HfxZr1-xO2 Ferroelectric Thin Film

Wi, Sungjae , Park, Hyunjae , Kim, Jiwan , Jo, Jaehyeong , Kwun, Hyunmin , Park, Kibog

Conference Paper Issue Date2025-02-14 View10
Lowering Effective Dielectric Constant of Ferroelectric Hf0.5Zr0.5O2 Film with an Ultra-Thin Al2O3 Intermediae Layer

Park, Jinyoung , Park, Hyunjae , Kwun, Hyunmin , Hyun, Eunseok , Jo, Jaehyeong , Kim, Jiwan , Song, Wonho , Kim, Junhyung , Park, Kibog

Conference Paper Issue Date2024-10-24 View117
Lowering Effective Dielectric Constant of Ferroelectric Hf0.5Zr0.5O2 Film with an Ultra-Thin Al2O3 Intermediae Layer

Park, Jinyoung , Park, Hyunjae , Kwun, Hyunmin , Hyun, Eunseok , Jo, Jaehyeong , Kim, Jiwan , Song, Wonho , Kim, Junhyung , Park, Kibog

Conference Paper Issue Date2024-07-29 View99
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