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Highly-conformal p-type copper(I) oxide (Cu2O) thin films by atomic layer deposition using a fluorine-free amino-alkoxide precursor File

Kim, Hangil , Lee, Min Young , Kim, Soo-Hyun , Bae, So Ik , Ko, Kyung Yong , Kim, Hyungjun , Kwon, Kyeong-Woo , Hwang, Jin-Ha , Lee, Do-Joong

Article Issue Date2015-09 View45
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