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A controlled growth of WNx, and WCx thin films prepared by atomic layer deposition File

Kim, Jun Beom , Jang, Byeonghyeon , Lee, Hyun-Jung , Han, Won Seok , Lee, Do-Joong , Lee, Han-Bo-Ram , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2016-04 View26
Atomic layer deposited molybdenum disulfide on Si photocathodes for highly efficient photoelectrochemical water reduction reaction File

Oh, Seungtaeg , Kim, Jun Beom , Song, Jun Tae , Oh, Jihun , Kim, Soo-Hyun

Article Issue Date2017-02 View32
Atomic layer deposited nanocrystalline tungsten carbides thin films as a metal gate and diffusion barrier for Cu metallization File

Kim, Jun Beom , Kim, Soo-Hyun , Han, Won Seok , Lee, Do-Joong

Article Issue Date2016-07 View32
Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier File

Kim, Jun Beom , Nandi, Dip K. , Kim, Tae Hyun , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2019-09 View37
Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu File

Jang, Yujin , Kim, Jun Beom , Hong, Tae Eun , Yeo, So Jeong , Lee, Sunju , Jung, Eun Ae , Park, Bo Keun , Chung, Taek-Mo , Kim, Chang Gyoun , Lee, Do-Joong , et al

Article Issue Date2016-04 View35
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