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AdPOC and t-AdOC as new deprotecting group in photoresist material

Jang, Ji-Hyun , Kim, Jin Baek

Conference Paper Issue Date2003-10-11 View46
Negative Photoresists Based on Cholic Acid Methacrylate Copolymerized with Methacrylates with 1,3-Dioxolane and 1,3-Dioxane Rings as Crosslinkers

Kim, Jin Baek , Ko, Jong Seong , Jang, Ji-Hyun , Lee, Beom Wook

Conference Paper Issue Date2002-10-01 View57
Photobleaching Photoacid Generator for ArF Lithography

Jang, Ji-Hyun , Kim, Jin Baek

Conference Paper Issue Date2001-04-01 View43
Synthesis and lithographic characterization of 1,4-dioxaspiro[4.7]dodecane-2-methyl methacrylate

Kim, Jin Baek , Jang, Ji-Hyun , Park, Jong JIn

Conference Paper Issue Date1998-01-01 View46
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