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Technological limitations of solid-source chemical vapor deposition of van der Waals heterostructures File File

Sitek, Jakub , Sitek, Wojciech , Conran, Ben R. , Wang, Xiaochen , McAleese, Clifford , Kaleta, Anna , Kret, Slawomir , Pasternak, Iwona , Zdrojek, Mariusz , Strupinski, Wlodek

Article Issue Date2025-08 View8
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