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Residual stress behavior in methylsilsesquioxane-based dielectric thin films File

Oh, W , Shin, Tae Joo , Ree, M , Jin, MY , Char, K

Article Issue Date2001-04 View23
Residual stress evolution in dielectric thin films prepared from poly(methylsilsesquioxane) precursor File

Oh, W , Shin, TJ , Ree, M , Jin, MY , Char, K

Article Issue Date2002-03 View41
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