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Influence of post-annealing on structural, optical and electrical properties of tin nitride thin films prepared by atomic layer deposition File

Ansari, Mohd Zahid , Janicek, Petr , Nandi, Dip K. , Palka, Karel , Slang, Stanislav , Kim, Deok Hyun , Cheon, Taehoon , Kim, Soo-Hyun

Article Issue Date2021-02 View15
Low-Temperature Atomic Layer Deposition of Highly Conformal Tin Nitride Thin Films for Energy Storage Devices File

Ansari, Mohd Zahid , Nandi, Dip K. , Janicek, Petr , Ansari, Sajid Ali , Ramesh, Rahul , Cheon, Taehoon , Shong, Bonggeun , Kim, Soo-Hyun

Article Issue Date2019-11 View15
Low-temperature growth of crystalline Tin(II) monosulfide thin films by atomic layer deposition using a liquid divalent tin precursor File

Ansari, Mohd Zahid , Janicek, Petr , Nandi, Dip K. , Slang, Stanislav , Bouska, Marek , Oh, Hongjun , Shong, Bonggeun , Kim, Soo-Hyun

Article Issue Date2021-11 View14
New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition File

Ansari, Mohd Zahid , Janicek, Petr , Namgung, Sook , Kim, Hyangil , Nandi, Dip K. , Cheon, Taehoon , Siddiqui, Masoom Raza , Imran, Muhammad , Jang, Yujin , Bae, Jong-Seong , et al

Article Issue Date2024-03 View19
Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor File

Ansari, Mohd Zahid , Janicek, Petr , Park, Ye Jin , NamGung, Sook , Cho, Bo Yeon , Nandi, Dip K. , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Cheon, Taehoon , et al

Article Issue Date2023-05 View24
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