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A controlled growth of WNx, and WCx thin films prepared by atomic layer deposition File

Kim, Jun Beom , Jang, Byeonghyeon , Lee, Hyun-Jung , Han, Won Seok , Lee, Do-Joong , Lee, Han-Bo-Ram , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2016-04 View24

Aqueous Microlenses for Localized Collection and Enhanced Raman Spectroscopy of Gaseous Molecules File

Kim, Yun-Tae , Kim, Daeik , Park, Sanghwan , Zhexembekova, Anar , Byeon, Mirang , Hong, Tae Eun , Lee, Jongwon , Lee, Chang Young

Article Issue Date2021-11 View66

Atomic Layer Deposited RuO2 Diffusion Barrier for Next Generation Ru-Interconnects File

Kim, Youn-Hye , Kim, Minsu , Kotsugi, Yohei , Cheon, Taehoon , Mohapatra, Debananda , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Ramesh, Rahul , An, Ki-Seok , et al

Article Issue Date2022-10 View62

Atomic layer deposited self-forming Ru-Mn diffusion barrier for seedless Cu interconnects File

Lee, Hyun-Jung , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2016-11 View29

Atomic layer deposition of Ru thin film using N-2/H-2 plasma as a reactant File

Hong, Tae Eun , Mun, Ki-Yeung , Choi, Sang-Kyung , Park, Ji-Yoon , Kim, Soo-Hyun , Cheon, Taehoon , Kim, Woo Kyoung , Lim, Byoung-Yong , Kim, Sunjung

Article Issue Date2012-07 View33

Atomic layer deposition of WNx thin films using a F-free tungsten metal-organic precursor and NH3 plasma as a Cu-diffusion barrier File

Kim, Jun Beom , Nandi, Dip K. , Kim, Tae Hyun , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2019-09 View35

Characterization of a Ru-based ternary-oxide thin film for a diffusion barrier File

Hong, Tae Eun , Jeong, E. D. , Byeon, M. R. , Kang, Y. B. , Yang, Ho-Soon , Kim, Soo-Hyun

Article Issue Date2012-09 View43

Development of highly conductive NbCx thin films using PEALD for diffusion barrier applications in Cu and Ru interconnects

Kim, Soo-Hyun , Hong, Tae Eun , Kim, Sang Bok , Bae, Jong-Seong , Kweon, Minjeong , Park, Chaehyun

Conference Paper Issue Date2024-11-20 View12

Effects of AlOx incorporation into atomic layer deposited Ru thin films: Applications to Cu direct plating technology File

Hong, Tae Eun , Cheon, Taehoon , Kim, Soo-Hyun , Kim, Jeong-Kyu , Park, Young-Bae , Kwon, Oh Joong , Kim, Myung Jun , Kim, Jae Jeong

Article Issue Date2013-12 View35

Fluorine-free Plasma Enhanced Atomic Layer Deposited Ultrathin Tungsten Nitride Thin Films for Dual Diffusion Barrier Performance File

Seo, Kang-Min , Mohapatra, Debananda , Bae, Gun-Woo , Ansari, Mohd Zahid , Son, Yeseul , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2023-12 View64

Formation of Layered Bi5Ti3FeO15 Perovskite in Bi2O3-TiO2-Fe2O3 Containing System File

Borse, Pramod H. , Yoon, Sang Su , Jang, Jum Suk , Lee, Jae Sung , Hong, Tae Eun , Jeong, Euh Duck , Won, Mi Sook , Jung, Ok-Sang , Shim, Yoon Bo , Kim, Hyun Gyu

Article Issue Date2009-12 View44

Graphene-Based Gas Sensors with High Sensitivity and Minimal Sensor-to-Sensor Variation File

Choi, Jae Hong , Lee, Junghyun , Byeon, Mirang , Hong, Tae Eun , Park, Hyesung , Lee, Chang Young

Article Issue Date2020-03 View59

Growth of highly conformal ruthenium-oxide thin films with enhanced nucleation by atomic layer deposition File

Park, Ji-Yoon , Yeo, Seungmin , Cheon, Taehoon , Kim, Soo-Hyun , Kim, Min-Kyu , Kim, Hyungjun , Hong, Tae Eun , Lee, Do-Joong

Article Issue Date2014-10 View25

Highly Conformal Amorphous W-Si-N Thin Films by Plasma-Enhanced Atomic Layer Deposition as a Diffusion Barrier for Cu Metallization File

Hong, Tae Eun , Jung, Jae-Hun , Yeo, Seungmin , Cheon, Taehoon , Bae, So Ik , Kim, Soo-Hyun , Yeo, So Jeong , Kim, Hyo-Suk , Chung, Taek-Mo , Park, Bo Keun , et al

Article Issue Date2015-01 View35

Highly-conformal nanocrystalline molybdenum nitride thin films by atomic layer deposition as a diffusion barrier against Cu File

Jang, Yujin , Kim, Jun Beom , Hong, Tae Eun , Yeo, So Jeong , Lee, Sunju , Jung, Eun Ae , Park, Bo Keun , Chung, Taek-Mo , Kim, Chang Gyoun , Lee, Do-Joong , et al

Article Issue Date2016-04 View35

Improved Rate Capability and Thermal Stability of LiNi0.5Co0.2Mn0.3O2 Cathode Materials via Nanoscale SiP2O7 Coating File

Lee, Yong-Seok , Ahn, Docheon , Cho, Young-Hyun , Hong, Tae Eun , Cho, Jaephil

Article Issue Date2011-12 View39

Impurity Reduction Leading to Enhanced Properties in Atomic Layer Deposited Ru Films by Introducing Additional Reactant for Cu Alternative Interconnects

Kim, Soo-Hyun , Hong, Tae Eun , Kim, Sang Bok , Bae, Jong-Seong , Son, Yeseul , Kim, Jeongha

Conference Paper Issue Date2024-11-20 View15

Nano SIMS characterization of boron- and aluminum-coated LiNi1/3Co1/3Mn1/3O2 cathode materials for lithium secondary ion batteries File

Hong, Tae Eun , Jeong, E. D. , Baek, S.R. , Byeon, M.R. , Lee, Young-Suck , Khan, F.Nawaz , Yang, Ho-Soon

Article Issue Date2012-01 View42

New class of Zr precursor containing boratabenzene ligand enabling highly conformal wafer-scale zirconium dioxide thin films through atomic layer deposition File

Ansari, Mohd Zahid , Janicek, Petr , Namgung, Sook , Kim, Hyangil , Nandi, Dip K. , Cheon, Taehoon , Siddiqui, Masoom Raza , Imran, Muhammad , Jang, Yujin , Bae, Jong-Seong , et al

Article Issue Date2024-03 View52

Phase-controlled growth of cobalt oxide thin films by atomic layer deposition File

Jung, Soonyoung , Nandi, Dip K. , Yeo, Seungmin , Kim, Hyungjun , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Kim, Soo-Hyun

Article Issue Date2018-03 View30

Preparation of wafer-scale highly conformalamorphous hafnium dioxide thin films by atomic layer deposition using a thermally stable boratabenzene ligand-containing hafnium precursor File

Ansari, Mohd Zahid , Janicek, Petr , Park, Ye Jin , NamGung, Sook , Cho, Bo Yeon , Nandi, Dip K. , Jang, Yujin , Bae, Jong-Seong , Hong, Tae Eun , Cheon, Taehoon , et al

Article Issue Date2023-05 View68

TaCx Thin Films Prepared by Atomic Layer Deposition as Diffusion Barriers for Cu Metallization File

Hong, Tae Eun , Kim, Tae-Ho , Jung, Jae-Hun , Kim, Soo-Hyun , Kim, Hoon

Article Issue Date2014-01 View65

The effects of nitrogen incorporation on the properties of atomic layer deposited Ru thin films as a direct-plateable diffusion barrier for Cu interconnect File

Mun, Ki-Yeung , Hong, Tae Eun , Cheon, Taehoon , Jang, Yujin , Lim, Byoung-Yong , Kim, Sunjung , Kim, Soo-Hyun

Article Issue Date2014-07 View30

The Exterior of Single-Walled Carbon Nanotubes as a Millimeter-Long Cation-Preferring Nanochannel File

Kim, Yun-Tae , Joo, Se Hun , Min, Hyegi , Lee, Jiyun , Moon, Seung Min , Byeon, Mirang , Hong, Tae Eun , Strano, Michael S. , Han, Jae-Hee , Kwak, Sang Kyu , et al

Article Issue Date2018-08 View23

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