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Low interface defect density of atomic layer deposition BeO with self-cleaning reaction for InGaAs metal oxide semiconductor field effect transistors File

Shin, H. S. , Yum, J. H. , Johnson, D. W. , Harris, H. R. , Hudnall, Todd. W. , Oh, J. , Kirsch, P. , Wang, W. -E. , Bielawski, C. W. , Banerjee, S. K. , et al

Article Issue Date2013-11 View61
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