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Browsing by Author : Harada, Ryosuke

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Atomic layer deposition of high-quality Pt thin film as an alternative interconnect replacing Cu File

Han, Seung-Min , Nandi, Dip K. , Joo, Yong-Hwan , Shigetomi, Toshiyuki , Suzuki, Kazuharu , Nabeya, Shunichi , Harada, Ryosuke , Kim, Soo-Hyun

Article Issue Date2020-05 View72
Atomic Layer Deposition of Iridium Using a Tricarbonyl Cyclopropenyl Precursor and Oxygen File

Park, Na-Yeon , Kim, Minsu , Kim, Youn-Hye , Ramesh, Rahul , Nandi, Dip K. , Tsugawa, Tomohiro , Shigetomi, Toshiyuki , Suzuki, Kazuharu , Harada, Ryosuke , Kim, Miso , et al

Article Issue Date2022-02 View176
Atomic Layer Deposition of Ru for Replacing Cu-Interconnects File

Kotsugi, Yohei , Han, Seung-Min , Kim, Youn-Hye , Cheon, Taehoon , Nandi, Dip K. , Ramesh, Rahul , Yu, Neung-Kyung , Son, Kirak , Tsugawa, Tomohiro , Ohtake, Shigeyuki , et al

Article Issue Date2021-07 View145
Ultralow Loading (Single-Atom and Clusters) of the Pt Catalyst by Atomic Layer Deposition Using Dimethyl ((3,4-eta) N,N-dimethyl-3-butene-1-amine-N) Platinum (DDAP) on the High-Surface-Area Substrate for Hydrogen Evolution Reaction File

Ramesh, Rahul , Han, Seungmin , Nandi, Dip K. , Sawant, Sandesh Y. , Kim, Deok Hyun , Cheon, Taehoon , Cho, Moo Hwan , Harada, Ryosuke , Shigetomi, Toshiyuki , Suzuki, Kazuharu , et al

Article Issue Date2021-02 View76
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