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Interfacial Adhesion Energy of Ru-AlO Thin Film Deposited by Atomic Layer Deposition between Cu and SiO2: Effect of the Composition of Ru-AlO Thin Film File

Kim, Jeong-Kyu , Cheon, Tae-Hoon , Kim, Soo-Hyun , Park, Young-Bae

Article Issue Date2012-05 View18
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