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Residual stress behavior in methylsilsesquioxane-based dielectric thin films File

Oh, W , Shin, Tae Joo , Ree, M , Jin, MY , Char, K

Article Issue Date2001-04 View22
Residual stress evolution in dielectric thin films prepared from poly(methylsilsesquioxane) precursor File

Oh, W , Shin, TJ , Ree, M , Jin, MY , Char, K

Article Issue Date2002-03 View38
Synthesis and characterization of new aromatic polyimides containing well-defined conjugation units File

Shin, Tae Joo , Park, HK , Lee, SW , Lee, B , Oh, W , Kim, JS , Baek, S , Hwang, YT , Kim, HC , Ree, M

Article Issue Date2003-06 View54
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