dc.citation.endPage |
111 |
- |
dc.citation.number |
1 |
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dc.citation.startPage |
110 |
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dc.citation.title |
IEEE TRANSACTIONS ON PLASMA SCIENCE |
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dc.citation.volume |
30 |
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dc.contributor.author |
Hur, Min Sup |
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dc.contributor.author |
Kim, SJ |
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dc.contributor.author |
Lee, HS |
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dc.contributor.author |
Lee, JK |
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dc.contributor.author |
Yeom, GY |
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dc.date.accessioned |
2023-12-22T11:39:44Z |
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dc.date.available |
2023-12-22T11:39:44Z |
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dc.date.created |
2014-11-12 |
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dc.date.issued |
2002-02 |
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dc.description.abstract |
Neutral beam processing is being considered as a new technique to reduce plasma-induced damage in materials processing. We report on particle-in-cell simulations of a neutral beam source. The system is composed of an ion-beam source and multireflectors which neutralize incident ions and reflect neutral particles. It is revealed from the simulations that about 2.8 % of the ion-current from an ion-beam source is successfully neutralized before reaching a diagnostic plate. |
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dc.identifier.bibliographicCitation |
IEEE TRANSACTIONS ON PLASMA SCIENCE, v.30, no.1, pp.110 - 111 |
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dc.identifier.doi |
10.1109/TPS.2002.1003948 |
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dc.identifier.issn |
0093-3813 |
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dc.identifier.scopusid |
2-s2.0-0036478185 |
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dc.identifier.uri |
https://scholarworks.unist.ac.kr/handle/201301/8797 |
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dc.identifier.url |
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0036478185 |
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dc.identifier.wosid |
000175845900054 |
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dc.language |
영어 |
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dc.publisher |
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC |
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dc.title |
Particle-in-cell simulation of a neutral beam source for materials processing |
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dc.type |
Article |
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dc.description.journalRegisteredClass |
scopus |
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