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Kim, Kyung Rok
Nano-Electronic Emerging Devices Lab.
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Highly Sensitive Plasmonic Terahertz Detector with Integrated Sub-Wavelength Aperture Based on Asymmetric FET in 65-nm CMOS Technology

Author(s)
Kim, Min JaeAhn, Sang HyoSong, Yoo BinRyu, Min WooKim, Kyung Rok
Issued Date
2023-07-02
DOI
10.1109/NANO58406.2023.10231290
URI
https://scholarworks.unist.ac.kr/handle/201301/74662
Citation
IEEE International Conference on Nanotechnology, pp.861 - 865
Abstract
We have analyzed the effect of structural asymmetry and aperture position for field-effect transistor (FET)-based plasmonic terahertz (THz) detector with integrated aperture by using 65-nm CMOS process. By applying structural asymmetry between the source and drain in FET, we obtained 9.3 mV (7-fold) photoresponse (Δ u) in comparison to symmetric FET for aperture positioned at gate. In addition, by asymmetry in feeding the incoming THz wave with aperture positioned at drain, we have experimentally demonstrated highly enhanced detection performance followed by 18.5 mV (2-fold) Δ u in comparison to aperture positioned at gate.
Publisher
IEEE Computer Society
ISSN
1944-9399

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