Full metadata record
DC Field | Value | Language |
---|---|---|
dc.citation.endPage | 1489 | - |
dc.citation.number | 8 | - |
dc.citation.startPage | 1481 | - |
dc.citation.title | NANOPHOTONICS | - |
dc.citation.volume | 12 | - |
dc.contributor.author | Kim, Sunghwan | - |
dc.contributor.author | Das, Bamadev | - |
dc.contributor.author | Ji, Kang Hyeon | - |
dc.contributor.author | Moghaddam, Mahsa Haddadi | - |
dc.contributor.author | Chen, Cheng | - |
dc.contributor.author | Cha, Jongjin | - |
dc.contributor.author | Namgung, Seon | - |
dc.contributor.author | Lee, Dukhyung | - |
dc.contributor.author | Kim, Dai-Sik | - |
dc.date.accessioned | 2023-12-21T12:43:12Z | - |
dc.date.available | 2023-12-21T12:43:12Z | - |
dc.date.created | 2023-04-06 | - |
dc.date.issued | 2023-04 | - |
dc.description.abstract | Cracks are formed along the photolithographically pre-determined lines with extremely high yield and repeatability, when Cu clusters are introduced between planarized Au thin films sequentially deposited on a PET substrate. These clusters act as nanometer-sized spacers preventing the formation of contiguous metallic bond between the adjacent Au layers which will render prepatterned-cracking impossible. While the effective gap width is initially zero in the optical sense from microwaves all the way to the visible, outer-bending the PET substrate allows the gap width tuning into the 100 nm range, with the stability and controllability in the ranges of 100 s and Angstrom-scale, respectively. It is anticipated that our wafer-scale prepatterned crack technology with an unprecedented mixture of macroscopic length and Angstrom-scale controllability will open-up many applications in optoelectronics, quantum photonics and photocatalysis. | - |
dc.identifier.bibliographicCitation | NANOPHOTONICS, v.12, no.8, pp.1481 - 1489 | - |
dc.identifier.doi | 10.1515/nanoph-2022-0680 | - |
dc.identifier.issn | 2192-8606 | - |
dc.identifier.scopusid | 2-s2.0-85150659587 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/65794 | - |
dc.identifier.wosid | 000946188800001 | - |
dc.language | 영어 | - |
dc.publisher | WALTER DE GRUYTER GMBH | - |
dc.title | Defining the zerogap: cracking along the photolithographically defined Au-Cu-Au lines with sub-nanometer precision | - |
dc.type | Article | - |
dc.description.isOpenAccess | TRUE | - |
dc.relation.journalWebOfScienceCategory | Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Optics; Physics, Applied | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics; Materials Science; Optics; Physics | - |
dc.type.docType | Article; Early Access | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordAuthor | metal crack | - |
dc.subject.keywordAuthor | photolithography | - |
dc.subject.keywordAuthor | quantum conductance | - |
dc.subject.keywordAuthor | sub-nanometer | - |
dc.subject.keywordAuthor | zerogap fabrication | - |
dc.subject.keywordPlus | PHASE-DIAGRAMS | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | AG-AU | - |
dc.subject.keywordPlus | CONDUCTANCE | - |
dc.subject.keywordPlus | NI | - |
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