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Park, Soojin
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Ordering of PS-b-P4VP on patterned silicon surfaces

Author(s)
Park, SoojinKim, BokyungYavuzcetin, OzgurTuominen, Mark T.Russell, Thomas P.
Issued Date
2008-07
DOI
10.1021/nn800073f
URI
https://scholarworks.unist.ac.kr/handle/201301/6461
Fulltext
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=49249124013
Citation
ACS NANO, v.2, no.7, pp.1363 - 1370
Abstract
We demonstrate a method to fabricate high-quality patterned micelle arrays using poly(styrene- b-4-vinylpyridine) (PS-b-P4VP) block copolymer. Long-range order of the PS-b-P4VP micelle in hexagonal arrays was induced by topographic grating patterns during solvent annealing. The size and row spacing of block copolymer micelle arrays created in this way were uniform. By controlling the thickness of the polymer on the crests and in the troughs of the grating patterns, we prepared PS-b-P4VP micelle arrays having different sizes.
Publisher
AMER CHEMICAL SOC
ISSN
1936-0851

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