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윤태식

Yoon, Tae-Sik
Nano Semiconductor Research Lab.
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dc.citation.startPage 106718 -
dc.citation.title MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING -
dc.citation.volume 147 -
dc.contributor.author Park, Kitae -
dc.contributor.author Chung, Peter Hayoung -
dc.contributor.author Sahu, Dwipak Prasad -
dc.contributor.author Yoon, Tae-Sik -
dc.date.accessioned 2023-12-21T13:48:39Z -
dc.date.available 2023-12-21T13:48:39Z -
dc.date.created 2022-05-27 -
dc.date.issued 2022-08 -
dc.description.abstract Artificial synapses with analog resistance changes have been actively investigated since they are essential elements in brain-inspired neuromorphic systems. In this study, interface state-dependent artificial synaptic characteristics of analog, linear, and symmetric synaptic weight update are demonstrated in Pt/CeO2/Pt memristors controlled by post-deposition annealing of CeO2 layer. The devices with optimized annealing temperature, i.e., 400 and 500 degrees C-annealed devices, show reliable and analog-type resistance decrease upon applying positive voltage, and vice versa upon applying negative voltage. The resistance change emulates wide-range, linear, and symmetric potentiation and depression behaviors, as being tunable by the number of pulses and its amplitude. It also exhibits short-term and long-term plasticity with respect to pulse conditions. The conduction modes are fitted well with Schottky conduction controlled by interface energy barrier. In addition, negligible resistance changes are observed in reference device with SiO2 interfacial layers inserted at top and bottom Pt/CeO2 interfaces, i.e., Pt/SiO2/CeO2/SiO2/Pt device, supporting that the resistance change is associated with tunable Pt/ CeO2 interface states. It is concluded that the resistance change is induced by voltage-driven tuning of Pt/CeO2 interface states, and the control of these interfaces is crucial for reliable synaptic operations. -
dc.identifier.bibliographicCitation MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, v.147, pp.106718 -
dc.identifier.doi 10.1016/j.mssp.2022.106718 -
dc.identifier.issn 1369-8001 -
dc.identifier.scopusid 2-s2.0-85128540155 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/58577 -
dc.identifier.url https://linkinghub.elsevier.com/retrieve/pii/S1369800122002608 -
dc.identifier.wosid 000794197800001 -
dc.language 영어 -
dc.publisher ELSEVIER SCI LTD -
dc.title Interface state-dependent synaptic characteristics of Pt/CeO2/Pt memristors controlled by post-deposition annealing -
dc.type Article -
dc.description.isOpenAccess FALSE -
dc.relation.journalWebOfScienceCategory Engineering, Electrical & Electronic; Materials Science, Multidisciplinary; Physics, Applied; Physics, Condensed Matter -
dc.relation.journalResearchArea Engineering; Materials Science; Physics -
dc.type.docType Article -
dc.description.journalRegisteredClass scie -
dc.description.journalRegisteredClass scopus -
dc.subject.keywordAuthor Artificial synapse -
dc.subject.keywordAuthor Memristors -
dc.subject.keywordAuthor CeO 2 -
dc.subject.keywordAuthor Annealing -
dc.subject.keywordAuthor Interface states -
dc.subject.keywordPlus BEHAVIOR -
dc.subject.keywordPlus SILICON -
dc.subject.keywordPlus CHARGE -
dc.subject.keywordPlus CERIA -
dc.subject.keywordPlus TAOX -

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