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정창욱

Jeong, Changwook
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플라즈마 도움 원자층 제어 증착법을 이용한 Al2O3 의 성장과 박막 특성의 연구

Alternative Title
Growth and Characterization of Aluminum Oxide (Al~ 2O~ 3) Thin Films by Plasma-Assisted Atomic Layer Controlled Deposition
Author(s)
정창욱이장식주승기
Issued Date
2000-10
URI
https://scholarworks.unist.ac.kr/handle/201301/58486
Citation
대한금속·재료학회지, v.38, no.10, pp.1395 - 1399
Publisher
대한금속·재료학회
ISSN
1738-8228

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