From MEMS to NEMS with carbon
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- From MEMS to NEMS with carbon
- Wang, CL; Madou, Mark
- Carbon-microelectromechanical system (C-MEMS); High-aspect ratio; Photoresist; Pyrolysis; Suspended structure
- Issue Date
- ELSEVIER ADVANCED TECHNOLOGY
- BIOSENSORS & BIOELECTRONICS, v.20, no.10, pp.2181 - 2187
- Our work in carbon-microelectromechanical systems (C-MEMS) suggests that C-MEMS might provide a very interesting material and microfabrication approach to battery miniaturization, active DNA arrays and a wide variety of chemical and biological sensors. In C-MEMS, photoresist is patterned by photolithography and subsequently pyrolyzed at high-temperatures in an oxygen-free environment. We established that it is possible to use C-MEMS to create very high-aspect ratio carbon structures (e.g. posts with an aspect ratio >10), suspended carbon plates and suspended carbon nanowires (C-NEMS). By changing the lithography conditions, soft and hard baking times and temperatures, additives to the resist, pyrolysis time, temperature and environment, C-MEMS permits a wide variety of interesting new MEMS and NEMS applications that employ structures having a wide variety of shapes, resistivities and mechanical properties. We also demonstrate that arrays of high-aspect ratio carbon posts can be charged/discharged with Li and this enables the fabrication of a smart switchable array of batteries.
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