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dc.citation.endPage 358 -
dc.citation.number 2 -
dc.citation.startPage 348 -
dc.citation.title JOURNAL OF MICROELECTROMECHANICAL SYSTEMS -
dc.citation.volume 14 -
dc.contributor.author Wang, CL -
dc.contributor.author Jia, GY -
dc.contributor.author Taherabadi, LH -
dc.contributor.author Madou, Mark -
dc.date.accessioned 2023-12-22T10:37:22Z -
dc.date.available 2023-12-22T10:37:22Z -
dc.date.created 2014-08-29 -
dc.date.issued 2005-04 -
dc.description.abstract A novel fabrication process was developed to create high aspect ratio (>10 : 1) carbon posts, all-carbon suspended bridges and wires, self-organized bunches of carbon posts, and carbon plates supported by carbon beams. The structures are all made from a two-step pyrolysis process with SU-8 photoresist as the starting material. In this paper we describe the fabrication of these various new C-MEMS structures and detail an important application of the high aspect ratio carbon posts arrays. The carbon post arrays can be reversible charged/discharged with Li ions, an application that may greatly impact the application of C-MEMS in three-dimensional microbatteries. Complex suspended C-MEMS structures, such as wires, plates, ribbons, and self-organized bunches of posts, were built. Methods to accurately and repeatedly fabricate all the above 3-D C-MEMS structures are given. -
dc.identifier.bibliographicCitation JOURNAL OF MICROELECTROMECHANICAL SYSTEMS, v.14, no.2, pp.348 - 358 -
dc.identifier.doi 10.1109/JMEMS.2004.839312 -
dc.identifier.issn 1057-7157 -
dc.identifier.scopusid 2-s2.0-18844425734 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/5760 -
dc.identifier.url http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=18844425734 -
dc.identifier.wosid 000228308600018 -
dc.language 영어 -
dc.publisher IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC -
dc.title A novel method for the fabrication of high-aspect ratio C-MEMS structures -
dc.type Article -
dc.description.journalRegisteredClass scopus -
dc.subject.keywordAuthor complex microelectromechanical systems (C-MEMS) -
dc.subject.keywordAuthor high-aspect ratio -
dc.subject.keywordAuthor Li intercalation -
dc.subject.keywordAuthor microbattery -
dc.subject.keywordAuthor photoresist -
dc.subject.keywordAuthor pyrolysis -
dc.subject.keywordAuthor suspended structure -
dc.subject.keywordPlus CARBON-FILMS -
dc.subject.keywordPlus PYROLYZED PHOTORESIST -
dc.subject.keywordPlus THICK -
dc.subject.keywordPlus MICROSTRUCTURES -
dc.subject.keywordPlus LITHOGRAPHY -
dc.subject.keywordPlus PERFORMANCE -
dc.subject.keywordPlus REDUCTION -
dc.subject.keywordPlus RADIATION -
dc.subject.keywordPlus RESIST -
dc.subject.keywordPlus LAYERS -

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