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DC Field | Value | Language |
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dc.citation.startPage | 23823 | - |
dc.citation.title | SCIENTIFIC REPORTS | - |
dc.citation.volume | 6 | - |
dc.contributor.author | Park, Woongkyu | - |
dc.contributor.author | Rhie, Jiyeah | - |
dc.contributor.author | Kim, Na Yeon | - |
dc.contributor.author | Hong, Seunghun | - |
dc.contributor.author | Kim, Dai-Sik | - |
dc.date.accessioned | 2023-12-22T00:06:51Z | - |
dc.date.available | 2023-12-22T00:06:51Z | - |
dc.date.created | 2021-10-21 | - |
dc.date.issued | 2016-03 | - |
dc.description.abstract | Advances in photolithographic processes have allowed semiconductor industries to manufacture smaller and denser chips. As the feature size of integrated circuits becomes smaller, there has been a growing need for a photomask embedded with ever narrower patterns. However, it is challenging for electron beam lithography to obtain <10 nm linewidths with wafer scale uniformity and a necessary speed. Here, we introduce a photolithography-based, cost-effective mask fabrication method based on atomic layer deposition and overhang structures for sacrificial layers. Using this method, we obtained sub-10 nm square ring arrays of side length 50 mu m, and periodicity 100 mu m on chromium film, on 1 cm by 1 cm quartz substrate. These patterns were then used as a contact-lithography photomask using 365 nm I-line, to generate metal ring arrays on silicon substrate. | - |
dc.identifier.bibliographicCitation | SCIENTIFIC REPORTS, v.6, pp.23823 | - |
dc.identifier.doi | 10.1038/srep23823 | - |
dc.identifier.issn | 2045-2322 | - |
dc.identifier.scopusid | 2-s2.0-84962441484 | - |
dc.identifier.uri | https://scholarworks.unist.ac.kr/handle/201301/54190 | - |
dc.identifier.url | https://www.nature.com/articles/srep23823 | - |
dc.identifier.wosid | 000373049500001 | - |
dc.language | 영어 | - |
dc.publisher | NATURE PUBLISHING GROUP | - |
dc.title | Sub-10 nm feature chromium photomasks for contact lithography patterning of square metal ring arrays | - |
dc.type | Article | - |
dc.description.isOpenAccess | FALSE | - |
dc.relation.journalWebOfScienceCategory | Multidisciplinary Sciences | - |
dc.relation.journalResearchArea | Science & Technology - Other Topics | - |
dc.type.docType | Article | - |
dc.description.journalRegisteredClass | scie | - |
dc.description.journalRegisteredClass | scopus | - |
dc.subject.keywordPlus | EUV LITHOGRAPHY | - |
dc.subject.keywordPlus | PHOTOLITHOGRAPHY | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | RESOLUTION | - |
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