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조재필

Cho, Jaephil
Nano Energy Storage Material Lab.
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dc.citation.endPage 219 -
dc.citation.number 1 -
dc.citation.startPage 214 -
dc.citation.title JOURNAL OF POWER SOURCES -
dc.citation.volume 109 -
dc.contributor.author Kim B. -
dc.contributor.author Cho Y.S. -
dc.contributor.author Lee J.-G. -
dc.contributor.author Joo K.-H. -
dc.contributor.author Jung K.-O. -
dc.contributor.author Oh J. -
dc.contributor.author Park B. -
dc.contributor.author Sohn H.-J. -
dc.contributor.author Kang T. -
dc.contributor.author Cho, Jaephil -
dc.contributor.author Park Y.-S. -
dc.contributor.author Oh J.Y. -
dc.date.accessioned 2023-12-22T11:40:45Z -
dc.date.available 2023-12-22T11:40:45Z -
dc.date.created 2014-06-27 -
dc.date.issued 2002 -
dc.description.abstract Among various solid electrolytes, the lithium-phosphorus oxynitride (Lipon) electrolyte synthesized by sputtering of Li3PO4 in pure N2 has a good ionic conductivity of 2(±1) × 10-6 Scm-1 at 25 °C. As the nitrogen concentration increases in the Lipon electrolyte, the ionic conductivity is reported to increase as a result of a higher degree of cross-links. When Lipon films are deposited by sputtering, however, it is reported that the maximum nitrogen concentration saturates approximately at 6at.%. By non-equilibrium processes, such as ion-implantation, nitrogen concentration can be controlled over 6at.%. This study investigates the effect of nitrogen concentration on the ionic conductivity in Lipon films by using ion-implantation. Impedance measurements at 25 °C show that the nitrogen-implanted Lipon films enhance or retard the ionic conductivity over a wide range after nitrogen-implantation, when compared with as-deposited thin-films. -
dc.identifier.bibliographicCitation JOURNAL OF POWER SOURCES, v.109, no.1, pp.214 - 219 -
dc.identifier.doi 10.1016/S0378-7753(02)00036-8 -
dc.identifier.issn 0378-7753 -
dc.identifier.scopusid 2-s2.0-0037097498 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/5114 -
dc.identifier.url http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0037097498 -
dc.identifier.wosid 000176480300029 -
dc.language 영어 -
dc.publisher ELSEVIER SCIENCE BV -
dc.title Ion-implantation modification of lithium-phosphorus oxynitride thin-films -
dc.type Article -
dc.description.journalRegisteredClass scopus -

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