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조재필

Cho, Jaephil
Nano Energy Storage Material Lab.
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Ion-implantation modification of lithium-phosphorus oxynitride thin-films

Author(s)
Kim B.Cho Y.S.Lee J.-G.Joo K.-H.Jung K.-O.Oh J.Park B.Sohn H.-J.Kang T.Cho, JaephilPark Y.-S.Oh J.Y.
Issued Date
2002
DOI
10.1016/S0378-7753(02)00036-8
URI
https://scholarworks.unist.ac.kr/handle/201301/5114
Fulltext
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=0037097498
Citation
JOURNAL OF POWER SOURCES, v.109, no.1, pp.214 - 219
Abstract
Among various solid electrolytes, the lithium-phosphorus oxynitride (Lipon) electrolyte synthesized by sputtering of Li3PO4 in pure N2 has a good ionic conductivity of 2(±1) × 10-6 Scm-1 at 25 °C. As the nitrogen concentration increases in the Lipon electrolyte, the ionic conductivity is reported to increase as a result of a higher degree of cross-links. When Lipon films are deposited by sputtering, however, it is reported that the maximum nitrogen concentration saturates approximately at 6at.%. By non-equilibrium processes, such as ion-implantation, nitrogen concentration can be controlled over 6at.%. This study investigates the effect of nitrogen concentration on the ionic conductivity in Lipon films by using ion-implantation. Impedance measurements at 25 °C show that the nitrogen-implanted Lipon films enhance or retard the ionic conductivity over a wide range after nitrogen-implantation, when compared with as-deposited thin-films.
Publisher
ELSEVIER SCIENCE BV
ISSN
0378-7753

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