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김태성

Kim, Taesung
Microfluidics & Nanomechatronics Lab.
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Fabricating a multi-level barrier-integrated microfluidic device using grey-scale photolithography

Author(s)
Nam, YoonkwangKim, MinseokKim, Taesung
Issued Date
2013-10
DOI
10.1088/0960-1317/23/10/105015
URI
https://scholarworks.unist.ac.kr/handle/201301/4243
Fulltext
http://www.scopus.com/inward/record.url?partnerID=HzOxMe3b&scp=84884552722
Citation
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, v.23, no.10, pp.1 - 7
Abstract
Most polymer-replica-based microfluidic devices are mainly fabricated by using standard soft-lithography technology so that multi-level masters (MLMs) require multiple spin-coatings, mask alignments, exposures, developments, and bakings. In this paper, we describe a simple method for fabricating MLMs for planar microfluidic channels with multi-level barriers (MLBs). A single photomask is necessary for standard photolithography technology to create a polydimethylsiloxane grey-scale photomask (PGSP), which adjusts the total amount of UV absorption in a negative-tone photoresist via a wide range of dye concentrations. Since the PGSP in turn adjusts the degree of cross-linking of the photoresist, this method enables the fabrication of MLMs for an MLB-integrated microfluidic device. Since the PGSP-based soft-lithography technology provides a simple but powerful fabrication method for MLBs in a microfluidic device, we believe that the fabrication method can be widely used for micro total analysis systems that benefit from MLBs. We demonstrate an MLB-integrated microfluidic device that can separate microparticles.
Publisher
IOP PUBLISHING LTD
ISSN
0960-1317
Keyword
SINGLE-EXPOSURE PHOTOLITHOGRAPHYGRAYSCALE MASKSSYSTEM

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