Graphoepitaxy of Block-Copolymer Self-Assembly Integrated with Single-Step ZnO Nanoimprinting
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- Graphoepitaxy of Block-Copolymer Self-Assembly Integrated with Single-Step ZnO Nanoimprinting
- Kim, Sarah; Shin, Dong Ok; Choi, Dae-Geun; Jeong, Jong-Ryul; Mun, Jeong Ho; Yang, Yong-Biao; Kim, Jaeup U.; Kim, Sang Ouk; Jeong, Jun-Ho
- Block copolymer thin films; Complex morphology; Graphoepitaxy; High thermal stability; Lateral ordering; Nano domain; Nano pattern; Nano-imprinting; Nanocylinders; NanoPatterning; Nanoscale assemblies; Pattern shape; Self-assembled; Self-consistent-field theory; Single-step; Single-step process; Sol-gel precursors; Trench depth; Tunabilities; Zinc oxide (ZnO); ZnO; ZnO substrate
- Issue Date
- WILEY-V C H VERLAG GMBH
- SMALL, v.8, no.10, pp.1563 - 1569
- A highly efficient, ultralarge-area nanaolithography that integrates block-copolymer lithography with single-step ZnO nanoimprinting is introduced. The UV-assisted imprinting of a photosensitive solgel precursor creates large-area ZnO topographic patterns with various pattern shapes in a single-step process. This straightforward approach provides a smooth line edge and high thermal stability of the imprinted ZnO pattern; these properties are greatly advantageous for further graphoepitaxial block-copolymer assembly. According to the ZnO pattern shape and depth, the orientation and lateral ordering of self-assembled cylindrical nanodomains in block-copolymer thin films could be directed in a variety of ways. Significantly, the subtle tunability of ZnO trench depth enabled by nanoimprinting, generated complex hierarchical nanopatterns, where surface-parallel and surface-perpendicular nanocylinder arrays are alternately arranged. The stability of this complex morphology is confirmed by self-consistent field theory (SCFT) calculations. The highly ordered graphoepitaxial nanoscale assembly achieved on transparent semiconducting ZnO substrates offers enormous potential for photonics and optoelectronics.
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