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Author

Park, Soojin
Nano-Functional Materials Lab
Research Interests
  • Block Copolymers, nanostructured materials for Lithium-Ion batteries, wearable and stretchable energy storage applications

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The fabrication of highly ordered block copolymer micellar arrays: control of the separation distances of silicon oxide dots

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Title
The fabrication of highly ordered block copolymer micellar arrays: control of the separation distances of silicon oxide dots
Author
Yoo, HanaPark, Soojin
Keywords
DIBLOCK COPOLYMER; THIN-FILMS; NANOSTRUCTURES; NANOPARTICLES; LITHOGRAPHY; TEMPLATES; SURFACES; ROUTE
Issue Date
201006
Publisher
IOP PUBLISHING LTD
Citation
NANOTECHNOLOGY, v.21, no.24, pp.1 - 7
Abstract
We demonstrate the fabrication of highly ordered silicon oxide dotted arrays prepared from polydimethylsiloxane (PDMS) filled nanoporous block copolymer (BCP) films and the preparation of nanoporous, flexible Teflon or polyimide films. Polystyrene-block-poly(2-vinylpyridine) (PS-b-P2VP) films were annealed in toluene vapor to enhance the lateral order of micellar arrays and were subsequently immersed in alcohol to produce nano-sized pores, which can be used as templates for filling a thin layer of PDMS. When a thin layer of PDMS was spin-coated onto nanoporous BCP films and thermally annealed at a certain temperature, the PDMS was drawn into the pores by capillary action. PDMS filled BCP templates were exposed to oxygen plasma environments in order to fabricate silicon oxide dotted arrays. By addition of PS homopolymer to PS-b-P2VP copolymer, the separation distances of micellar arrays were tuned. As-prepared silicon oxide dotted arrays were used as a hard master for fabricating nanoporous Teflon or polyimide films by spin-coating polymer precursor solutions onto silicon patterns and peeling off. This simple process enables us to fabricate highly ordered nanoporous BCP templates, silicon oxide dots, and flexible nanoporous polymer patterns with feature size of sub-20 nm over 5 cm x 5 cm.
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DOI
http://dx.doi.org/10.1088/0957-4484/21/24/245304
ISSN
0957-4484
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