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Self-Assembly of Carbon Atoms on Transition Metal Surfaces-Chemical Vapor Deposition Growth Mechanism of Graphene

Author(s)
Zhang, XiuyunLi, HuiDing, Feng
Issued Date
2014-08
DOI
10.1002/adma.201305922
URI
https://scholarworks.unist.ac.kr/handle/201301/31332
Fulltext
https://onlinelibrary.wiley.com/doi/full/10.1002/adma.201305922
Citation
ADVANCED MATERIALS, v.26, no.31, pp.5488 - 5495
Abstract
As the most promising method for high quality, large area graphene synthesis, chemical vapor decomposition (CVD) has drawn enormous attention. Understanding of the growth mechanism is crucial for optimizing the experimental design to synthesize the desired graphene for various applications. Recently, many theoretical efforts have been devoted to explore the decomposition of feedstock, nucleation of small graphene islands, and the expansion of graphene islands to a large graphene sheet on various catalyst surfaces. Here we summarize the key progresses on the three aspects in order to provide a complete scenery of graphene CVD growth at the atomic level and to guide the experimental design for the synthesis of desired graphene, e. g., high quality graphene sheets with large single crystalline domains or controlled doping.
Publisher
WILEY-V C H VERLAG GMBH
ISSN
0935-9648
Keyword
SINGLE-LAYER GRAPHENELARGE-AREACOPPEREDGEORIENTATIONFILMSKINETICSCLUSTERSHYDROGEN

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