File Download

There are no files associated with this item.

  • Find it @ UNIST can give you direct access to the published full text of this article. (UNISTARs only)
Related Researcher

이종은

Lee, Jongeun
Intelligent Computing and Codesign Lab.
Read More

Views & Downloads

Detailed Information

Cited time in webofscience Cited time in scopus
Metadata Downloads

Full metadata record

DC Field Value Language
dc.citation.endPage 716 -
dc.citation.startPage 704 -
dc.citation.title IEEE TRANSACTIONS ON NANOTECHNOLOGY -
dc.citation.volume 18 -
dc.contributor.author Fouda, Mohammed E. -
dc.contributor.author Lee, Sugil -
dc.contributor.author Lee, Jongeun -
dc.contributor.author Eltawil, Ahmed -
dc.contributor.author Kurdahi, Fadi -
dc.date.accessioned 2023-12-21T18:59:09Z -
dc.date.available 2023-12-21T18:59:09Z -
dc.date.created 2019-08-14 -
dc.date.issued 2019-07 -
dc.description.abstract Resistive crossbar arrays, despite their advantages such as parallel processing, low power, and high density, suffer from the sneak path problem created by IR voltage drops. The crossbar non-idealities considerably degrade the accuracy of matrix multiplication operation, which is the cornerstone of hardware accelerated neural networks. In this paper, we propose a novel technique to capture the sneak path problem to enable off-chip learning and weight transfer. The proposed technique can be easily integrated into any neural network training framework. Performance results show a significant improvement after retraining the network with the proposed mask technique. Two mask solutions have been proposed and studied to capture the sneak path problem in resistive crossbar arrays. Both mask solutions were successfully able to achieve classification accuracy close to the baseline accuracy. The tradeoffs between the two solutions are discussed and compared in terms of accuracy, power, and area. -
dc.identifier.bibliographicCitation IEEE TRANSACTIONS ON NANOTECHNOLOGY, v.18, pp.704 - 716 -
dc.identifier.doi 10.1109/TNANO.2019.2927493 -
dc.identifier.issn 1536-125X -
dc.identifier.scopusid 2-s2.0-85069953175 -
dc.identifier.uri https://scholarworks.unist.ac.kr/handle/201301/27795 -
dc.identifier.url https://ieeexplore.ieee.org/document/8763919 -
dc.identifier.wosid 000477731000003 -
dc.language 영어 -
dc.publisher IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC -
dc.title Mask Technique for Fast and Efficient Training of Binary Resistive Crossbar Arrays -
dc.type Article -
dc.description.isOpenAccess FALSE -
dc.relation.journalWebOfScienceCategory Engineering, Electrical & Electronic; Nanoscience & Nanotechnology; Materials Science, Multidisciplinary; Physics, Applied -
dc.relation.journalResearchArea Engineering; Science & Technology - Other Topics; Materials Science; Physics -
dc.type.docType Article -
dc.description.journalRegisteredClass scie -
dc.description.journalRegisteredClass scopus -
dc.subject.keywordAuthor RRAMs -
dc.subject.keywordAuthor memristors -
dc.subject.keywordAuthor neural networks -
dc.subject.keywordAuthor mask -
dc.subject.keywordAuthor binary -
dc.subject.keywordAuthor BNNs -
dc.subject.keywordAuthor neuromorphic hardware -
dc.subject.keywordAuthor sneak path -
dc.subject.keywordAuthor IR drop -
dc.subject.keywordPlus NETWORK -

qrcode

Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.